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  • 機(jī)械剝離單層二硒化鉬薄膜

    Monolayer molybdenum diselenide (1H-MoSe?) flakes have been exfoliated from bulk molybdenum diselenide (2H-MoSe?) onto 90nm thermal oxide and measures from 5micron up to 40micron in size.

    更新時(shí)間:2024-06-03
    產(chǎn)品價(jià)格:6371.3
    廠商性質(zhì):生產(chǎn)廠家
    訪問(wèn)次數(shù):804
  • 機(jī)械剝離單層二硒化錸薄膜

    Monolayer Rhenium diselenide flakes have been exfoliated from bulk ReSe? crystals onto 90nm thermal oxide and measures from 5micron up to 40micron in size.

    更新時(shí)間:2024-06-03
    產(chǎn)品價(jià)格:6481.15
    廠商性質(zhì):生產(chǎn)廠家
    訪問(wèn)次數(shù):822
  • 機(jī)械剝離單層二硫化鎢薄膜

    Monolayer tungsten disulfide (1H-WS?) flakes have been exfoliated from bulk tungsten disulfide (2H-WS?) onto 90nm thermal oxide and measures from 5micron up to 40micron in size.

    更新時(shí)間:2024-06-03
    產(chǎn)品價(jià)格:6371.3
    廠商性質(zhì):生產(chǎn)廠家
    訪問(wèn)次數(shù):797
  • 機(jī)械剝離單層二硒化鎢薄膜

    Monolayer tungsten diselenide (1H-WSe?) flakes have been exfoliated from bulk tungsten diselenide (2H-WSe?) onto 90nm thermal oxide and measures from 5micron up to 40micron in size.

    更新時(shí)間:2024-06-03
    產(chǎn)品價(jià)格:6371.3
    廠商性質(zhì):生產(chǎn)廠家
    訪問(wèn)次數(shù):810
  • CVD轉(zhuǎn)移生長(zhǎng)MX2單分子膜

    Substrate: Sapphire (c-cut) Quartz (Silica) TEM grids (please supply grids) Thermal Oxide (SiO2/Si) Polyethylene terephthalate – PET Substrates Pick your own substrates (please define the substrate ty

    更新時(shí)間:2024-06-03
    產(chǎn)品價(jià)格:7579.65
    廠商性質(zhì):生產(chǎn)廠家
    訪問(wèn)次數(shù):972
  • CVD缺陷生長(zhǎng)二維層

    Newly acquired ion implantation accelerator unit allows 2Dsemiconductors USA to create desired amounts of defects by alpha particle irradiation process at select amount of doses.

    更新時(shí)間:2024-06-03
    產(chǎn)品價(jià)格:8900
    廠商性質(zhì):生產(chǎn)廠家
    訪問(wèn)次數(shù):909
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